The client faced significant challenges due to the high complexity of the Design, the intricate verification environment, and the overwhelming volume of verification work tight schedule.
Qualitest stepped in to provide broader coverage, increase the number of tests, expose bugs, and enhance the verification environment’s capabilities—delivering greater assurance and confidence.
Lesser bugs and possible defects in the end product, increased portability, and higher functional coverage.
A leading chip manufacturer is the world’s largest semiconductor company by revenue, developing x86 microprocessors used in most PCs. It supplies processors to major computer manufacturers, along with motherboard chipsets, NICs, flash memory, graphics chips, and embedded processors.
Co-designed with a leading technology company, its IPU 200G SoC leverages insights from multiple FPGA Smart NIC generations to enhance performance, security, and workload isolation, helping cloud and communication service providers optimize CPU efficiency.
The leading chip manufacturer faced challenges in verifying the complex design of Remote Direct Memory Access (RDMA), a critical component of its product. Ensuring thorough verification required a highly intricate environment with thousands of System Verilog files, leading to missed deadlines and prolonged chip tape-out.
Delays impacted time-to-market, further pressured by a key technology partner’s involvement due to its proprietary IP within the subsystem. Additionally, frequent internal employee migration disrupted schedules, requiring new joiners to ramp up quickly with minimal support.
With low reliance on previous projects due to new feature integration, extensive new testing was needed at multiple abstraction levels. To enhance verification quality and efficiency, the company approached Qualitest for experienced verification engineers.
Qualitest delivered a high-impact verification service with rapid turnaround, ensuring quick understanding of the client’s environment and early identification of critical gaps by.: